Towards New Functionalities Through Modification
Modification techniques in direct-write nanomanufacturing provide a precise and site-selective means to tailor material properties at the nanoscale. By enabling controlled adjustments to mechanical, electronic, magnetic, or optical characteristics, these methods are essential for advancing next-generation technologies. Ion beams allow for direct material doping and property tuning, while electron-based processes offer possibilities from non-invasive refinement towards full chemical purification. Together, these approaches ensure high precision and versatility, addressing the increasing demand for functionalized nanostructures across a wide range of applications.
Literature
A Review on Direct-Write Nanoprinting of Functional 3D Structures with Focused Electron Beams; V. Reisecker, R. Winkler, H. Plank; Adv. Funct. Mater. (2024), 34, 2407567.
Roadmap for Focused Ion Beam Technologies; K. Höflich et al.; Appl. Phys. Rev (2023), 10, 041311.
Living up to its Potential – Direct-Write Nanofabrication with Focused Electron Beams; M. Huth, F. Porrati, S. Barth; J. Appl. Phys. (2021), 130, 170901.
Directing Matter: Toward Atomic-Scale 3D Nanofabrication; S. Jesse et al.; ACS Nano (2016), 10, 6, 5600.
2025 Roadmap on 3D Nanomagnetism; G. Gubbiotti et al.; J. Phys.: Condens. Matter (2025), 37, 143502.
Three-Dimensional Nanomagnetism; A. Fernández-Pacheco et al.; Nat. Commun. (2017), 8, 15756.
Launching a New Dimension with 3D Magnetic Nanostructures; P. Fischer et al.; APL Mater. (2020), 8, 010701.
Mechanical Properties of 3D Nanostructures Obtained by Focused Electron/Ion Beam-Induced Deposition: A Review; I. Utke et al.; Micromachines (2020), 11(4), 397.
Superconducting Materials and Devices Grown by Focused Ion and Electron Beam Induced Deposition; P. Orús et al.; Nanomaterials (2022), 12(8), 1367.
Focused Ion Beam Processing for 3D Chiral Photonics Nanostructures; M. Manoccio et al.; Micromachines (2021), 12(1), 6.
Material Functionality in FEBID: A Central Challenge and Opportunity
Although Focused Electron Beam Induced Deposition (FEBID) is a truly powerful high-resolution fabrication technique, most as-grown structures contain high levels of carbon due to incomplete precursor decomposition. This often degrades – or even fully suppresses – their intended functionality, whether electrical, magnetic, optical, or catalytic. However, a versatile post-deposition treatment toolbox is available to address this issue, as summarized in the adjacent image. These methods include thermal annealing, electron- or laser-assisted curing, and in-situ purification in reactive gas environments. Together, they enable substantial tuning of material composition and functional properties. This not only allows transformation into fully metallic structures, but – more importantly – opens the pathway to precisely tailor materials toward their targeted functionality in global but also localized way, underscoring the transformative potential of post-growth optimization.
Literature
A Review on Direct-Write Nanoprinting of Functional 3D Structures with Focused Electron Beams; V. Reisecker, R. Winkler, H. Plank; Adv. Funct. Mater. (2024), 34, 2407567.
Living up to its Potential – Direct-Write Nanofabrication with Focused Electron Beams; M. Huth, F. Porrati, S. Barth; J. Appl. Phys. (2021), 130, 170901.
Focused Electron Beam Induced Deposition Meets Materials Science; M. Huth, F. Porrati, O.V. Dobrovolskiy; Microelectronic Engineering (2018), 185, 9.
Precursors for Direct-Write Nanofabrication with Electrons; S. Barth, M. Huth, F. Jungwirth; J. Mater. Chem. C (2020), 8, 15884.
Instrumental Synergy
The same advanced instrumentation used for deposition and removal processes forms the foundation for these powerful modification techniques. Focused Ion Beam (FIB) microscopes, Gas Injection System (GIS) equipped Scanning Electron Microscope (SEM) and FIB-SEM dual beam systems enable precise control over ion-based doping and electron-based property tuning. This shared platform highlights the versatility and efficiency of direct-write technologies, ensuring seamless integration of modification processes into existing workflows.
Manufacturers
Hitachi Microscopy, JEOL Microscopy, Orsay Physics, Raith, TESCAN, Thermo Fisher Scientific, Zeiss Microscopy