Deposition – Introduction

Redefining Possibilities: The Future of 3D Nanoscale Manufacturing

Direct-write deposition techniques enable the creation of 3D nanostructures with unmatched precision and versatility. By leveraging focused particle beams, it becomes possible to fabricate freeform architectures on virtually any surface, with applications extending from nanoelectronics over nanomagnetics and nanooptics towards superconductivity and others. Core Benefits include:

  • Nanoscale precision: individual features down to the sub-50 nm regime are routinely possible, while sub-20 nm elements can be achieved under optimized conditions.
  • True 3D Fabrication: Overcome planar constraints to realize free-standing, multi-dimensional structures.
  • Multi-Material Integration: Combine diverse materials in a single structure to achieve novel functionalities.
  • Mask-Free Flexibility: Directly write structures with nanoscale accuracy without requiring templates.

This technology is a cornerstone for breakthroughs where design freedom, material diversity, and nanoscale precision are required.

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Electrons and Ions: Tailoring Nanostructures with Precision and Versatility

Writing with electrons enable deposition with minimal energy dissipation, ensuring a milling- and impurity-free process with low temperature rise ideal for sensitive applications. Ion beams, mostly using Ga but increasingly complemented by NOArNe, or Xe via plasma sources provide higher deposition rates. In particular, they facilitate material tuning for functional properties such as mechanics, magnetism or conductivity. The versatility of combining these beams broadens the range of achievable nanostructures, while the choice of species ensures tailored results for specific needs, such as robustness or rapid material growth.

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Hybrid Deposition Approaches

Deposition technologies transcend traditional fabrication through technological hybrid approaches to unlock new materials and functionalities. By combining direct-write printing with additional processes, such as temperature control (e.g., heating stages or lasers), exposure to reactive gases, or multiple precursor delivery, it becomes possible to fine-tune deposition outcomes and expand functional capabilities. Furthermore, post-growth processes like Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) can be employed, where the original direct-write structures serve as templates or scaffolds for further material enhancements. These hybrid techniques create a versatile toolkit for achieving high-performance nanostructures, combining the precision of direct-write fabrication with advanced material control and scalability for tailored applications.

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Adapted from Aleksei Tsarapkin et al., Advanced Materials 2024, 36 (23), 2313571. Licensed under CC BY 4.0.


Advanced Instrumentation: The Backbone of Direct-Write Deposition

Direct-write deposition is typically performed using FIB-SEM dual-beam microscopes, which are commonly equipped with gas injection systems (GIS) and patterning engines. For FEBID-specific tasks, a standalone scanning electron microscope (SEM) outfitted with a GIS and patterning engine may suffice. However, more complex applications, such as multi-material fabrication or hybrid FEBID-FIBID approaches, often require advanced instrumentation featuring multiple GIS units for enhanced material flexibility. Thanks to the widespread availability of dual-beam microscopes in scientific and industrial laboratories worldwide, access to this technology is increasingly attainable, providing an accessible entry point for a broad range of users.

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