Towards New Functionalities Through Modification
Modification techniques in direct-write nanomanufacturing provide a precise and site-selective means to tailor material properties at the nanoscale. By enabling controlled adjustments to mechanical, electronic, magnetic, or optical characteristics, these methods are essential for advancing next-generation technologies. Ion beams allow for direct material doping and property tuning, while electron-based processes offer possibilities from non-invasive refinement towards full chemical purification. Together, these approaches ensure high precision and versatility, addressing the increasing demand for functionalized nanostructures across a wide range of applications.
Literature
Resource A, full citation
Resource B , full citation
Resource C , full citation
Instrumental Synergy
The same advanced instrumentation used for deposition and removal processes forms the foundation for these powerful modification techniques. Focused Ion Beam (FIB) microscopes, Gas Injection System (GIS) equipped Scanning Electron Microscope (SEM) and FIB-SEM dual beam systems enable precise control over ion-based doping and electron-based property tuning. This shared platform highlights the versatility and efficiency of direct-write technologies, ensuring seamless integration of modification processes into existing workflows.
Literature
Resource A, full citation
Resource B , full citation
Resource C , full citation