Shaping the Future: The Power of Direct-Write Technologies
Direct-write nanomanufacturing merges precision, flexibility, and speed — using focused electron and ion beams to create fully customizable structures without masks or templates. From the direct placement and removal of materials to the tuning of local properties, this technology delivers nanoscale control with unmatched freedom.
What truly sets it apart is the ability to fabricate true 3D geometries — not just layers, but freeform structures with nanometer accuracy. Add to that multi-material integration, and you unlock functional designs that combine electrical, magnetic, and optical properties within a single object.
Beyond performance, direct-write is not only ideal for rapid-prototyping but inherently resource-efficient, minimizing waste while fitting seamlessly into hybrid manufacturing workflows. Whether it’s nanoelectronics, quantum tech, microrobotics, or life sciences — this technology pool expands the boundaries of what’s possible at the nanoscale.
Literature
A Review on Direct-Write Nanoprinting of Functional 3D Structures with Focused Electron Beams; V. Reisecker, R. Winkler, H. Plank; Adv. Funct. Mater. (2024), 34, 2407567.
Roadmap for Focused Ion Beam Technologies; K. Höflich et al.; Appl. Phys. Rev (2023), 10, 041311.
Living Up to Its Potential – Direct-Write Nanofabrication with Focused Electron Beams; M. Huth, F. Porrati, S. Barth; J. Appl. Phys. (2021), 130, 170901.
Concept of Focused Electron Beam Induced Deposition (FEBID) for additive direct-write nano-manufacturing (left) and its possibility to create freestanding 3D nanoarchitectures (right).
Shematic overview of different FIB approaches. Adapted from Katja Höflich et al., Appl. Phys. Rev. 2023, 10, 041311. Licensed under CC BY 4.0.