ELISA – Electrons in Lithography and Imaging for Science and Application (together with FEBIP / BEACON)
ELISA 2026 explores the full spectrum of electron–matter interaction, from the mechanisms that govern secondary electron production, energy transfer, chemistry, and material response, to the technologies that harness these effects for imaging, patterning, and nanofabrication. The meeting connects fundamental studies on electron generation through high energy photons, as is the case in EUV- and X-ray lithography, as well as […]