Electronics

Enabling the Next Generation of Nanodevices

In nanoelectronics, direct-write technologies enable the creation of customized conductive, semi-conductive, and insulating nanostructures for advanced electronic components down to the lowest nanoscale. The combination of FEBID, FIBID, FIB, and hybrid post-processing methods allows for:

  • Conductive Nanowires: FEBID-deposited platinum and gold nanowires with dimensions below 20 nm for interconnects or advanced sensor architecture designs even in 3D architectures.
  • Single-Electron Devices: Quantum dots and single electron field effect transistors with site-selective precision.
  • Resistive Switching Devices: Tailored structures for memristors towards neuromorphic computing with 3D aspects.

A standout example is the demonstration of a FEBID-based single-electron transistor (SET). This nanoscale device showcases the ability to achieve quantum functionality with unparalleled precision, thanks to the atomic-level control offered by FEBID. The direct-write approach ensures optimal placement and connectivity of the quantum dot within the transistor structure, enabling reliable and efficient single-electron tunneling behavior. This breakthrough highlights the potential of direct-write nanomanufacturing for quantum electronics and low-power computing applications. Another notable example is the demonstration of directly written FEBID-based memristors, enabling resistive switching devices with excellent control over dimensions and material properties. These memristors are key components for neuromorphic computing, offering energy-efficient and scalable solutions for next-generation electronics.

These methods address the demands of scalable, precise, and high-performance nanoelectronics, opening pathways for the development of ultra-fast and miniaturized nanoscale components.

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